| 摘要 |
The subject of the invention is a material comprising a substrate (1) coated over at least one portion of at least one of its faces with a thin-film multilayer comprising at least two layers based on a transparent electrically conductive oxide (2, 3) separated by at least one intermediate dielectric layer (4), the physical thickness of which is at most 50 nm, no metallic layer being placed between said layers based on a transparent electrically conductive oxide (2, 3), said multilayer also comprising at least one oxygen barrier layer (6) on top of the layer based on a transparent electrically conductive oxide (2) furthest away from the substrate (1), each layer based on a transparent electrically conductive oxide (2, 3) having a physical thickness within a range extending from 20 nm to 80 nm. |
