发明名称 FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To prevent the side face of a produced film from having a slope shape, in thickening of the film by utilizing cold spray.SOLUTION: A film deposition method includes steps for: (A) bringing a wall member into contact with the edge of a film deposition target surface of a substrate; (B) depositing a film by a cold spray method onto the film deposition target surface; and (C) removing the wall member after the thickness of the film formed on the film deposition target surface reaches a desired film thickness.
申请公布号 JP2014159611(A) 申请公布日期 2014.09.04
申请号 JP20130030371 申请日期 2013.02.19
申请人 MITSUBISHI HEAVY IND LTD 发明人 SAITO MAKOTO;HIRAMATSU NORIYUKI;FUKUSHIMA AKIRA
分类号 C23C24/04 主分类号 C23C24/04
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