发明名称 |
METHOD FOR PRODUCING SEMICONDUCTOR DEVICE STRUCTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a robus power semiconductor device.SOLUTION: The method includes a step of carrying out a first implantation, in order to produce two differently doped semiconductor zones 22, 23 of the same conductivity type, for implanting dopant atoms of a first conductivity type into a semiconductor body via one of sides over the whole area; a step of producing a mask on the one side so as to partially expose the one surface; a step of removing at least a dopant implanted portion by moving from the one side into the region exposed by the mask in the semiconductor body; and a step of removing the mask. Before or after removing the mask, a second implantation is carried out for implanting the dopant atoms of the first conductivity type into the semiconductor body via one of sides. |
申请公布号 |
JP2014160841(A) |
申请公布日期 |
2014.09.04 |
申请号 |
JP20140077175 |
申请日期 |
2014.04.03 |
申请人 |
INFINEON TECHNOLOGIES AUSTRIA AG |
发明人 |
SCHULZE HANS-JOACHIM;PFAFFENLEHNER MANFRED |
分类号 |
H01L29/739;H01L21/265;H01L21/266;H01L21/329;H01L21/336;H01L29/78;H01L29/861;H01L29/868 |
主分类号 |
H01L29/739 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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