发明名称 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a robus power semiconductor device.SOLUTION: The method includes a step of carrying out a first implantation, in order to produce two differently doped semiconductor zones 22, 23 of the same conductivity type, for implanting dopant atoms of a first conductivity type into a semiconductor body via one of sides over the whole area; a step of producing a mask on the one side so as to partially expose the one surface; a step of removing at least a dopant implanted portion by moving from the one side into the region exposed by the mask in the semiconductor body; and a step of removing the mask. Before or after removing the mask, a second implantation is carried out for implanting the dopant atoms of the first conductivity type into the semiconductor body via one of sides.
申请公布号 JP2014160841(A) 申请公布日期 2014.09.04
申请号 JP20140077175 申请日期 2014.04.03
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 SCHULZE HANS-JOACHIM;PFAFFENLEHNER MANFRED
分类号 H01L29/739;H01L21/265;H01L21/266;H01L21/329;H01L21/336;H01L29/78;H01L29/861;H01L29/868 主分类号 H01L29/739
代理机构 代理人
主权项
地址