| 摘要 |
PROBLEM TO BE SOLVED: To reduce the number of times of heat treatment, in thickening of a film by utilizing cold spray.SOLUTION: A film deposition method has a step for executing a unit film deposition process repeatedly until the thickness of a film formed on a film deposition target reaches a desired film thickness. The unit film deposition process includes (A) a step S1 for installing the film deposition target in a chamber, (B) a step S2 for setting the atmosphere in the chamber in a non-oxidative gas atmosphere or a vacuum atmosphere, (C) a step S3 for depositing a film onto the film deposition target by a cold spray method in the atmosphere, and (D) a step S4 for applying heat treatment to the film deposition target after film deposition. |
