| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a photomask blank that includes a light shielding film capable of controlling the width of variation in surface reflectivity, that results from the variation in film thickness of a surface antireflection layer, to be small.SOLUTION: A photomask blank that is used to manufacture a photomask to which an exposure light of wavelength of 200 nm or less is applied, characterized in that: the photomask blank includes a translucent substrate and a light shielding film formed on the translucent substrate; the light shielding film has a light shielding layer that comprises transition metal and silicon, and a surface antireflection layer that is formed in contact with the top of the light shielding layer and is made of a material comprising transition metal and silicon and also at least one of oxygen and nitrogen; and the surface antireflection layer has a refractive index n of 1.4 or more and 2.9 or less, and an extinction coefficient k of 0.4 or more and 1.3 or less.</p> |
