发明名称 IN-SITU SPUTTERING APPARATUS
摘要 A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.
申请公布号 US2014246313(A1) 申请公布日期 2014.09.04
申请号 US201313782270 申请日期 2013.03.01
申请人 POOLE VENTURA, INC. 发明人 Erickson Mark R.;Poole Henry J.;Custer, III Arthur W.;Hershcovitch Ady
分类号 C23C14/04;C23C14/35 主分类号 C23C14/04
代理机构 代理人
主权项 1. A sputtering apparatus comprising: a target presented as an inner surface of a confinement structure; a cathode adjacent the target, the cathode providing a hollow core; a magnetron disposed within the hollow core; an actuator communicating with the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator; a carriage supporting the cathode and communicating with the target; a cable bundle interacting with the cathode; and a cable bundle take up mechanism secured to the cable bundle.
地址 Oxnard CA US