GLASS SUBSTRATE FOR FLAT PANEL DISPLAY AND MANUFACTURING METHOD THEREOF

摘要

A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3, and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.

主权项

1. A flat panel display glass substrate, the flat panel display glass substrate comprising a glass comprising, as expressed in mol %:
55-80% SiO2; 3-20% Al2O3; 3-15% B2O3; 3-25% RO, where RO represents the total amount of MgO, CaO, SrO, and BaO; and substantially no As2O3 and Sb2O3,wherein
the strain point of the glass is 700° C. or more the devitrification temperature of the glass is 1250° C. or less, the glass substrate has a heat shrinkage rate of 75 ppm or less, and the heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by: the heat shrinkage rate (ppm) ={the amount of shrinkage of the glass substrate after the thermal treatment/the length of the glass substrate before the heat treatment}×106.