发明名称 Group 13 nitride crystal, group 13 nitride crystal substrate, and method of manufacturing group 13 nitride crystal
摘要 A group 13 nitride crystal (19) having a hexagonal crystal structure contains at least a nitrogen atom and at least one metal atom selected from a group consisting of B, Al, Ga, In and Tl. Dislocation density of basal plane dislocations (P) in a cross section parallel to a c-axis is 10 4 cm -2 or more.
申请公布号 EP2708622(A3) 申请公布日期 2014.09.03
申请号 EP20130183203 申请日期 2013.09.05
申请人 RICOH COMPANY LTD. 发明人 HAYASHI, MASAHIRO;SATOH, TAKASHI;KIMURA, CHIHARU;MIYOSHI, NAOYA;MURAKAMI, AKISHIGE;MIYAKE, SHINSUKE;WADA, JUNICHI;SARAYAMA, SEIJI
分类号 C30B9/12;C30B29/40 主分类号 C30B9/12
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