发明名称 |
Group 13 nitride crystal, group 13 nitride crystal substrate, and method of manufacturing group 13 nitride crystal |
摘要 |
A group 13 nitride crystal (19) having a hexagonal crystal structure contains at least a nitrogen atom and at least one metal atom selected from a group consisting of B, Al, Ga, In and Tl. Dislocation density of basal plane dislocations (P) in a cross section parallel to a c-axis is 10 4 cm -2 or more. |
申请公布号 |
EP2708622(A3) |
申请公布日期 |
2014.09.03 |
申请号 |
EP20130183203 |
申请日期 |
2013.09.05 |
申请人 |
RICOH COMPANY LTD. |
发明人 |
HAYASHI, MASAHIRO;SATOH, TAKASHI;KIMURA, CHIHARU;MIYOSHI, NAOYA;MURAKAMI, AKISHIGE;MIYAKE, SHINSUKE;WADA, JUNICHI;SARAYAMA, SEIJI |
分类号 |
C30B9/12;C30B29/40 |
主分类号 |
C30B9/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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