| 摘要 |
PURPOSE: A treatment solution discharge device capable is provided to completely remove the minute liquid which remains on the nozzle surface of a head. CONSTITUTION: A gantry is provided on the upper part of the moving path of a substrate support unit. A cleaning unit washes the nozzle surface of a head(410~430). The cleaning unit includes a suction nozzle(1020) and current guide members(1030a,1030b). The suction nozzle inhales drug solution remaining on the nozzle surface of the head through a suction hole. To minimize the twist of current between the nozzle surface of the head and the suction nozzle, the current guide members are installed in a different height on both sides of the suction nozzle. |
