发明名称 In-situ sputtering appartus
摘要 <p>A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.</p>
申请公布号 EP2772931(A1) 申请公布日期 2014.09.03
申请号 EP20130185520 申请日期 2013.09.23
申请人 POOLE VENTURA, INC.;BROOKHAVEN SCIENCE ASSOCIATES LLC 发明人 ERICKSON, MARK;POOLE, HENRY;CUSTER, ARTHUR;HERSHCOVITCH, ADY
分类号 H01J37/34;H01J37/32 主分类号 H01J37/34
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