发明名称 ELECTRON MICROSCOPE AND SAMPLE HOLDER
摘要 An object of the present invention is to provide a sample holding unit for an electron beam apparatus which allows observation of a reaction between a sample and gas. In order to solve one of the above-stated problems, the present invention includes: electron beam apparatus sample holding means in which a diaphragm is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.
申请公布号 EP2541583(A4) 申请公布日期 2014.09.03
申请号 EP20100846469 申请日期 2010.12.01
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 YAGUCHI, TOSHIE;NAGAKUBO, YASUHIRA;WATABE, AKIRA
分类号 H01J37/20;H01J37/26 主分类号 H01J37/20
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