Lithographic apparatus and device manufacturing method
摘要
<p>A lithographic apparatus is provided in which the projection system (PL) is compliantly mounted on a reference frame (5) which in turn is compliantly mounted on the base (BP) which supports the apparatus. Therefore any vibrations and displacement errors in the base (BP) are filtered through two sets of compliant mounts (6, 7) and therefore disturbance of the projection system (PL) is reduced. <IMAGE></p>
申请公布号
EP1380899(B1)
申请公布日期
2014.09.03
申请号
EP20030254358
申请日期
2003.07.09
申请人
ASML NETHERLANDS B.V.
发明人
FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS;LOOPSTRA, ERIK ROELOF;BARTRAY, PERTRUS RUTGERUS;VAN DER WIJST, MARK WILHELMUS MARIA;RENKENS, MICHAEL JOZEFA MATHIJS;VAN SCHOTHORST, GERARD;DRIES, JOHAN JULIANA
