Surface treatment methods and systems for substrate processing

摘要

Embodiments provided herein describe methods and systems for processing substrates. A plasma including radical species and charged species is generated. The charged species of the plasma are collected. A substrate is exposed to the radical species of the plasma. A layer is formed on the substrate after exposing the substrate to the radical species.

主权项

1. A method for processing a substrate in a chamber, the method comprising:
generating a plasma in the chamber, wherein the plasma comprises radical species and charged species and the plasma species is based on one of hydrogen, nitrogen, argon, oxygen, ammonia, helium, or a combination thereof; collecting the charged species; providing the radical species to the substrate, wherein a film feedstock is not provided to the substrate during the providing of the radical species to the substrate; and after the providing, depositing a layer on the substrate.