Lithographic apparatus and device manufacturing method

摘要

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

主权项

1. A lithographic apparatus comprising:
a movable table; a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate; and a liquid supply system configured to at least partly fill a space between the projection system and the table with a temperature controlled liquid, the liquid supply system comprising a liquid confinement member extending at least partly between the projection system and the table, the table being movable with respect to the liquid confinement member and the liquid confinement member comprising:
a surface laterally extending from and around a path of the radiation beam through the liquid and facing toward the table,an outlet in the surface to remove liquid from the space, andan open aperture in at least part of the surface between the projection system and the table to allow fluid connection between the projection system and the table, wherein the liquid supply system is configured to provide a laminar flow of the temperature controlled liquid into a path of the radiation beam through the space.