Charged particle beam drawing apparatus and article manufacturing method using same

摘要

The charged particle beam drawing apparatus of the present invention is a charged particle beam drawing apparatus that renders a pattern on a substrate using a charged particle beam and includes a detector that detects charge amount depending on the irradiation of the charged particle beam; first and second deflectors that are arranged along the direction of the irradiation of the charged particle beam and are capable of deflecting the charged particle beam; and a controller that controls the first and second deflectors, wherein the controller transmits a signal, which is used for switching the irradiation/nonirradiation of the charged particle beam to the detector, to the first and second deflectors at a predetermined timing, and adjusts the operation timing of the first and second deflectors based on the output of the detector depending on the signal.

主权项

1. A charged particle beam drawing apparatus that renders a pattern on a substrate using a charged particle beam, the charged particle beam drawing apparatus comprising:
a detector that detects charge amount depending on irradiation of the charged particle beam; first and second deflectors that are arranged along a direction of the irradiation of the charged particle beam and are configured to deflect the charged particle beam; and a controller that controls the first and second deflectors, wherein the controller transmits a signal used for switching the irradiation to nonirradiation to the detector, and a signal used for switching the nonirradation to the irradiation to the detector to the first and second deflectors at a predetermined timing, calculates a lag time in operation start timings of the first and second deflectors based on a ratio between an output of the detector, depending on the signals and a value indicating the output of the detector in a case where no lag time exists in the operation start timings of the first and second deflectors, and adjusts the operation timing of the first and second deflectors based on the lag time.