| 摘要 |
An apparatus, system and method are described that enable an impedance of a plasma load to be matched with a power generator. In some embodiments the apparatus includes a power output adapted to apply power that is utilized to energize a plasma; a sensor adapted to sample power applied at the power output so as to obtain power samples; and an impedance control output configured to provide, responsive to the power samples, an impedance-control signal that enables an impedance matching network connected to the output of the power generator and to the impedance control output to match, responsive to the an impedance-control signal, the impedance of the plasma to the operating impedance of the power generator. |
