| 摘要 |
<p>The present invention relates to a film formation apparatus for forming thin films having high gas barrier performance, such as a DLC (Diamond Like Carbon) film, SiOx film, SiOC film, SiOCN film, SiNx film, and AlOx film, on thet inner surface and/or outer surface of containers such as PET bottoles. The film formation apparatus is provided with: a vacuum chamber for forming, in a vacuum stae, a film on a surfzce of a container (4) using a heat generating element (21); a vacuum evacuation devcie for vacuumizing the vacuum chamber; and a relative shifting device for relatively shifting the container (4) and the heat generating element (21) in the vacuum chaber after starting vacuumization of the vaccum chamber.</p> |
