Thin silicon solar cell and method of manufacture

摘要

A method of fabricating a solar cell is disclosed. The method includes the steps of forming a sacrificial layer on a silicon substrate, forming a doped silicon layer atop the sacrificial substrate, forming a silicon film atop the doped silicon layer, forming a plurality of interdigitated contacts on the silicon film, contacting each of the plurality of interdigitated contacts with a metal contact, and removing the sacrificial layer.

主权项

1. A method, comprising:
epitaxially depositing a sacrificial layer on a silicon substrate; forming a doped silicon layer on the sacrificial layer; forming a silicon film on the doped silicon layer; forming an insulating layer on the silicon film; forming alternating P-type and N-type doped regions in the silicon film, wherein the alternating P-type and N-type doped regions include at least one P-type doped region and at least one N-type doped region; contacting the P-type and N-type doped regions with a metal contact; and removing the sacrificial layer.