发明名称 PHOTORESIST SPRAYING APPARATUS FOR MANUFACTURING CYLINDRICAL STAMP
摘要 <p>The present invention relates to a photoresist applying apparatus for manufacturing a cylindrical stamp, which can uniformly apply various photoresists at a predetermined thickness on a surface of a cylindrical mold for manufacturing the cylindrical stamp used in a roll to roll process. A photoresist applying apparatus for manufacturing a cylindrical stamp according to the present invention comprises: a first clamp coupled to a first supporter and to which one end of a cylindrical mold is coupled; a second clamp rotatably coupled to a second supporter so as to face the first clamp such that the other end of the cylindrical mold is coupled thereto; a rotation device providing a rotational force to the first clamp; at least one heater disposed on at least one of the first clamp and the second clamp so as to heat the cylindrical mold; a nozzle having a jet orifice that is directed toward an outer circumference of the cylindrical mold in order to spray a photoresist on the outer circumference of the cylindrical mold that is coupled to the first clamp and the second clamp; a nozzle supporter supporting the nozzle; and a moving device moving the nozzle supporter in a longitudinal direction of the cylindrical mold.</p>
申请公布号 KR101436757(B1) 申请公布日期 2014.09.02
申请号 KR20130130041 申请日期 2013.10.30
申请人 SANGJIN MICRON CO., LTD. 发明人 LEE, CHANG RIN;SUNG, CHUN SIK;LEE, JUN HO;WOO, DONG HWI;KIM, GYUNG DONG;HWANG, JEONG JIN
分类号 G03F7/16;H01L21/027;H01L21/30 主分类号 G03F7/16
代理机构 代理人
主权项
地址