发明名称 |
PHOTORESIST SPRAYING APPARATUS FOR MANUFACTURING CYLINDRICAL STAMP |
摘要 |
<p>The present invention relates to a photoresist applying apparatus for manufacturing a cylindrical stamp, which can uniformly apply various photoresists at a predetermined thickness on a surface of a cylindrical mold for manufacturing the cylindrical stamp used in a roll to roll process. A photoresist applying apparatus for manufacturing a cylindrical stamp according to the present invention comprises: a first clamp coupled to a first supporter and to which one end of a cylindrical mold is coupled; a second clamp rotatably coupled to a second supporter so as to face the first clamp such that the other end of the cylindrical mold is coupled thereto; a rotation device providing a rotational force to the first clamp; at least one heater disposed on at least one of the first clamp and the second clamp so as to heat the cylindrical mold; a nozzle having a jet orifice that is directed toward an outer circumference of the cylindrical mold in order to spray a photoresist on the outer circumference of the cylindrical mold that is coupled to the first clamp and the second clamp; a nozzle supporter supporting the nozzle; and a moving device moving the nozzle supporter in a longitudinal direction of the cylindrical mold.</p> |
申请公布号 |
KR101436757(B1) |
申请公布日期 |
2014.09.02 |
申请号 |
KR20130130041 |
申请日期 |
2013.10.30 |
申请人 |
SANGJIN MICRON CO., LTD. |
发明人 |
LEE, CHANG RIN;SUNG, CHUN SIK;LEE, JUN HO;WOO, DONG HWI;KIM, GYUNG DONG;HWANG, JEONG JIN |
分类号 |
G03F7/16;H01L21/027;H01L21/30 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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