发明名称 |
Temperature detecting apparatus, substrate processing apparatus and method of manufacturing semiconductor device |
摘要 |
A temperature detecting apparatus is provided which is capable of suppressing disconnection of a thermocouple wire or positional deviation of a thermocouple junction portion caused by change over time. The temperature detecting apparatus includes: an insulation rod installed to extend in a vertical direction and including a through-hole in vertical direction; a thermocouple wire inserted in the through-hole of the insulation rod, the thermocouple wire including a thermocouple junction portion at an upper end thereof and an angled portion at a lower end of the insulation rod; and a buffer area installed below the insulation rod and configured to suppress a restriction of a horizontal portion of the angled portion upon heat expansion, wherein an upper portion of the thermocouple wire or a middle portion in the vertical direction are supported by the insulation rod. |
申请公布号 |
US8822240(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201213536418 |
申请日期 |
2012.06.28 |
申请人 |
Hitachi Kokusai Electric Inc. |
发明人 |
Kosugi Tetsuya;Ueno Masaaki;Yamaguchi Hideto |
分类号 |
G01R31/26;H01L21/66;G01K1/12;H01L21/67;G01K7/04;G01K7/02 |
主分类号 |
G01R31/26 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. A temperature detecting apparatus comprising:
an insulation rod installed to extend in a vertical direction and including a plurality of through-holes in a vertical direction; a thermocouple wire inserted in one of the through-holes of the insulation rod, the thermocouple wire including a thermocouple junction portion at an upper end thereof and an angled portion at a lower end of the insulation rod; and a buffer area installed below the insulation rod and configured to suppress a restriction of a horizontal portion of the angled portion upon heat expansion, wherein the thermocouple wire includes a supported portion between an upper end surface of the insulation rod and the thermocouple junction portion, the supported portion supported by the upper end surface of the insulation rod. |
地址 |
Tokyo JP |