发明名称 Photosensitive resin composition for black matrix
摘要 A photosensitive resin composition for a black matrix and a black matrix formed with the same are provided. The photosensitive resin composition for a black matrix includes a solvent consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., and the first solvent, the second solvent, and the third solvent are an aliphatic compound and use at least one solvent composition selected from a group consisting of alkyl ester, alkyl ketone, alkyl ether, and alkyl alcohol, and thus a uniform thin film having no surface defect can be obtained, and the photosensitive resin composition has an excellent process property while securing a high light shielding property and thus a black matrix pattern having a few defect can be obtained, and is thus useful for a liquid crystal display.
申请公布号 US8822127(B2) 申请公布日期 2014.09.02
申请号 US200912997224 申请日期 2009.09.28
申请人 LG Chem, Ltd. 发明人 Choi Dong Chang;Choi Kyung Soo;Ji Ho Chan;Cha Geun Young;Kim Sung-Hyun
分类号 G03F7/004;G03F7/027;G02F1/13 主分类号 G03F7/004
代理机构 Rothwell, Figg, Ernst & Manbeck, P.C. 代理人 Rothwell, Figg, Ernst & Manbeck, P.C.
主权项 1. A photosensitive resin composition for a black matrix comprising a coloring dispersion, a binder resin, a functional monomer having an ethylenically unsaturated bond, a photopolymerization initiator, and solvents, wherein the solvents have a solvent system consisting of 5-30 weight % of a first solvent having a boiling point of 110-159° C., 55-90 weight % of a second solvent having a boiling point of 160-200° C., and 3-15 weight % of a third solvent having a boiling point of 201-280° C., wherein, each of the first solvent, the second solvent, and the third solvent is an aliphatic compound, wherein the third solvent is at least one selected from the group consisting of diethyleneglycolmonoethylether, hexylbutyrate, diethyleneglycol methyletheracetate, diethyleneglycolbutyl methyl ether, tripropylglycoldimethyl ether, triethyleneglycoldimethylether, diethyleneglycolethyletheracetate, diethyleneglycolbutyletheracetate, 3-epoxy-1,2-propanediol, ethyl-4-acetylbutyrate, diethyleneglycolmonobutylether, tripropylglycolmethyl ether, diethyleneglycol, 2-(2-butoxyethoxy)ethylacetate, catechol, triethyleneglycol methylether, diethyleneglycoldibutylether, triethyleneglycol ethylether, diethyleneglycolmonohexylether, triethyleneglycol butyl methyl ether, triethyleneglycolbutylether, tripropylglycol, and tetraethyleneglycoldimethylether; wherein in the composition, a carbon black content, based on an overall solid content, is in the range of 50-85 weight %, and wherein the overall solid content is a sum of components except for the solvents.
地址 Seoul KR