发明名称 |
Applicators for microneedles |
摘要 |
A microneedle applicator is provided which has two roughly concentric portions which may be, for example, a solid disk and an annulus surrounding it. On the skin-facing side of the inner portion of the applicator a microneedle array is located. The outer portion of the applicator is placed against the skin, contacting it at a zone. The microneedle array is then pressed towards the skin. |
申请公布号 |
US8821446(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US200812009954 |
申请日期 |
2008.01.22 |
申请人 |
Corium International, Inc. |
发明人 |
Trautman Joseph C.;Worsham Robert Wade;Bayramov Danir F.;Bowers Danny Lee;Klemm Steven Richard;Singh Parminder |
分类号 |
A61M5/00 |
主分类号 |
A61M5/00 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
Mahoney Jacqueline F.;Mohr Judy M.;McDermott Will & Emery LLP |
主权项 |
1. An applicator for a microprojection array, comprising:
an inner portion and an outer portion that is concentric to and integral with the inner portion; a contact zone on the outer portion for contacting skin at an application site; a region on the inner portion to which a microprojection array can be attached; wherein upon application of force to the inner portion, the applicator is deformable from a first configuration to a second configuration in which the applicator stably remains until a further force is applied to the applicator, wherein the microprojection array contacts the application site when the applicator is in the second configuration; and wherein the applicator, when placed adjacent skin at the application site in its first configuration, has a shape such that the outer portion slopes towards the skin such that the contact zone is capable of contacting the skin, and the applicator has a shape in its second configuration wherein the outer portion extends away from the skin such that the contact zone is no longer in skin contact. |
地址 |
Menlo Park CA US |