Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional area

摘要

A method for locally resolved measurement of a radiation distribution (24) produced using a lithography mask (16) comprises providing a radiation converter (31, 131) having an at least two-dimensional arrangement of converter elements (32, 132) which can respectively be put in an active and a passive state, and are configured to convert incoming radiation in respect of its wavelength in the active state. The method further includes: manipulating the radiation converter (31, 131) several times such that respectively only a fraction of the converter elements (32, 132) adopts the active state, irradiating the radiation converter (31, 131) with the radiation distribution (24) after every manipulation of the radiation converter (31, 131) so that the active converter elements (32, 132) emit wavelength-converted is measuring radiation (34), recording respective places of origin (54) of the measuring radiation at every irradiation with the radiation distribution (24).

主权项

1. A projection exposure tool for microlithography, comprising a radiation detector with a detection surface, configured to perform a radiation measurement simultaneously at plural locations of the detection surface and to measure a distribution of exposure radiation of the projection exposure tool irradiated onto the detection surface with a local resolution resolving structures smaller than 20 nm.