发明名称 |
Method for preparing samples for imaging |
摘要 |
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples. |
申请公布号 |
US8822921(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201314144902 |
申请日期 |
2013.12.31 |
申请人 |
FEI Company |
发明人 |
Schmidt Michael;Blackwood Jeffrey;Stone Stacey;Lee Sang Hoon;Kelley Ronald |
分类号 |
G01N23/00;G01N1/32 |
主分类号 |
G01N23/00 |
代理机构 |
Scheinberg & Associates, P.C. |
代理人 |
Scheinberg & Associates, P.C. ;Scheinberg Michael O. |
主权项 |
1. A method of preparing a sample for analysis, the method comprising:
directing an ion beam toward a work piece to remove material and expose a surface, the exposed surface having irregularities; depositing material on the exposed surface, the deposited material smoothing the irregularities; and directing an ion beam toward the work piece to remove at least some deposited materials and some material from the exposed surface to produce a smooth surface. |
地址 |
Hillsboro OR US |