发明名称 Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
摘要 An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.
申请公布号 US8822913(B2) 申请公布日期 2014.09.02
申请号 US201113312704 申请日期 2011.12.06
申请人 FEI Company 发明人 Graupera Anthony;Otis Charles
分类号 H01J27/16;H01J27/02;H01J49/26;B01D59/44 主分类号 H01J27/16
代理机构 Scheinberg & Associates, PC 代理人 Scheinberg & Associates, PC ;Scheinberg Michael O.
主权项 1. A charged particle beam system, comprising: an inductively coupled plasma ion source; one or more gas sources for providing multiple gases to the plasma ion source to produce multiple ion species simultaneously from the plasma ion source; a mass filter to select an ion species from the multiple ion species produced by the plasma ion source; and focusing optics to produce a focused beam of the selected ion species at a target, the beam having a submicron diameter at the target.
地址 Hillsboro OR US
您可能感兴趣的专利