发明名称 |
Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions |
摘要 |
An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another. |
申请公布号 |
US8822913(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201113312704 |
申请日期 |
2011.12.06 |
申请人 |
FEI Company |
发明人 |
Graupera Anthony;Otis Charles |
分类号 |
H01J27/16;H01J27/02;H01J49/26;B01D59/44 |
主分类号 |
H01J27/16 |
代理机构 |
Scheinberg & Associates, PC |
代理人 |
Scheinberg & Associates, PC ;Scheinberg Michael O. |
主权项 |
1. A charged particle beam system, comprising:
an inductively coupled plasma ion source; one or more gas sources for providing multiple gases to the plasma ion source to produce multiple ion species simultaneously from the plasma ion source; a mass filter to select an ion species from the multiple ion species produced by the plasma ion source; and focusing optics to produce a focused beam of the selected ion species at a target, the beam having a submicron diameter at the target. |
地址 |
Hillsboro OR US |