发明名称 Light guide plate and backlight module
摘要 The present invention provides a light guide plate and a backlight module. The backlight module comprises the light guide plate. The light guide plate comprises a plurality of elongated microstructures disposed on the light guide plate and parallel to a light-incident surface thereof. At least one curve parameter of profiles of the elongated microstructures is altered according to a position variation in an extending direction of the elongated microstructures, so as to adjust a brightness distribution in the extending direction of the elongated microstructures. The invention can improve a luminous efficiency of the light guide plate.
申请公布号 US8821002(B2) 申请公布日期 2014.09.02
申请号 US201113375338 申请日期 2011.08.22
申请人 Shenzhen China Star Optoelectronics Technology Co., Ltd. 发明人 Chang Kuangyao;Fang Kuojun;Hu Chechang
分类号 F21V7/04 主分类号 F21V7/04
代理机构 代理人 Friedman Mark M.
主权项 1. A light guide plate, characterized in that: the light guide plate comprises: a light-incident surface; and a plurality of elongated microstructures disposed on one side which is opposite to a light-emitting surface of the light guide plate, and parallel to the light-incident surface, wherein at least one curve parameter of profiles of the elongated microstructures is altered according to a position variation in an extending direction of the elongated microstructures, so as to adjust a brightness distribution in the extending direction of the elongated microstructures; wherein the at least one curve parameter of the profiles of the elongated microstructures is a curvature radius, an arc length, a tangential edge angle between a profile curve and the light guide plate, a base angle, a width or a height; wherein the curve parameter of each of the microstructures is symmetrically varied in the extending direction; wherein the curve parameter of each of the microstructures is varied discontinuously or continuously; wherein the profiles of the elongated microstructures are arcs, and when a curvature radius of the profiles is altered according to the position variation in the extending direction of the elongated microstructures, the curvature radius of the profiles at the middle position of the elongated microstructures is less than the curvature radius of the profiles at both sides of the elongated microstructures.
地址 Shenzhen CN