发明名称 |
Hot electron injection nanocrystals MOS transistor |
摘要 |
The disclosure relates to a hot electron injection MOS transistor, comprising source and drain regions formed in a semiconductor substrate, a control gate, and a floating gate comprising electrically conductive nanoparticles. The control gate comprises a first portion arranged at a first distance from the substrate, a second portion arranged at a second distance less than the first distance from the substrate, and an intermediary portion linking the first and the second portions. |
申请公布号 |
US8824210(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201213439140 |
申请日期 |
2012.04.04 |
申请人 |
STMicroelectronics (Rousset) SAS |
发明人 |
La Rosa Francesco |
分类号 |
G11C16/10 |
主分类号 |
G11C16/10 |
代理机构 |
Seed IP Law Group PLLC |
代理人 |
Seed IP Law Group PLLC |
主权项 |
1. A hot electron injection MOS transistor, comprising:
source and drain regions formed in a semiconductor substrate; a control gate; and a floating gate that includes electrically conductive nanoparticles configured to accumulate electrical charges, the floating gated being arranged between the control gate and the substrate, wherein the control gate comprises:
a first portion arranged closer to the source region than to the drain region and at a first distance from the substrate;a second portion arranged closer to the drain region than to the source region, directly above a hot electron injection zone, and at a second distance, less than the first distance, from the substrate; andan intermediary portion linking the first and the second portions. |
地址 |
Rousset FR |