发明名称 Hot electron injection nanocrystals MOS transistor
摘要 The disclosure relates to a hot electron injection MOS transistor, comprising source and drain regions formed in a semiconductor substrate, a control gate, and a floating gate comprising electrically conductive nanoparticles. The control gate comprises a first portion arranged at a first distance from the substrate, a second portion arranged at a second distance less than the first distance from the substrate, and an intermediary portion linking the first and the second portions.
申请公布号 US8824210(B2) 申请公布日期 2014.09.02
申请号 US201213439140 申请日期 2012.04.04
申请人 STMicroelectronics (Rousset) SAS 发明人 La Rosa Francesco
分类号 G11C16/10 主分类号 G11C16/10
代理机构 Seed IP Law Group PLLC 代理人 Seed IP Law Group PLLC
主权项 1. A hot electron injection MOS transistor, comprising: source and drain regions formed in a semiconductor substrate; a control gate; and a floating gate that includes electrically conductive nanoparticles configured to accumulate electrical charges, the floating gated being arranged between the control gate and the substrate, wherein the control gate comprises: a first portion arranged closer to the source region than to the drain region and at a first distance from the substrate;a second portion arranged closer to the drain region than to the source region, directly above a hot electron injection zone, and at a second distance, less than the first distance, from the substrate; andan intermediary portion linking the first and the second portions.
地址 Rousset FR