发明名称 Apparatus and method for three dimensional integrated circuits
摘要 A structure comprises a substrate comprising a plurality of traces on top of the substrate, a plurality of connectors formed on a top surface of a semiconductor die, wherein the semiconductor die is formed on the substrate and coupled to the substrate through the plurality of connectors and a dummy metal structure formed at a corner of a top surface of the substrate, wherein the dummy metal structure has two discontinuous sections.
申请公布号 US8823170(B2) 申请公布日期 2014.09.02
申请号 US201213706436 申请日期 2012.12.06
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Wu Sheng-Yu;Tsai Pei-Chun;Chang Chih-Horng;Kuo Tin-Hao;Chen Chen-Shien
分类号 H01L23/48;H01L21/50;H01L23/498 主分类号 H01L23/48
代理机构 Slater and Matsil, L.L.P. 代理人 Slater and Matsil, L.L.P.
主权项 1. A structure comprising: a substrate comprising a plurality of traces on a top surface of the substrate; a plurality of connectors formed on a top surface of a semiconductor die, wherein the semiconductor die is bonded on the substrate and coupled to the substrate through the plurality of connectors; and a dummy metal structure formed at a corner of the top surface of the substrate, wherein the dummy metal structure has two discontinuous sections, and wherein a first discontinuous section is located inside an edge of the semiconductor die and a second discontinuous section is located outside the edge of the semiconductor die.
地址 Hsin-Chu TW