发明名称 |
Apparatus and method for three dimensional integrated circuits |
摘要 |
A structure comprises a substrate comprising a plurality of traces on top of the substrate, a plurality of connectors formed on a top surface of a semiconductor die, wherein the semiconductor die is formed on the substrate and coupled to the substrate through the plurality of connectors and a dummy metal structure formed at a corner of a top surface of the substrate, wherein the dummy metal structure has two discontinuous sections. |
申请公布号 |
US8823170(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201213706436 |
申请日期 |
2012.12.06 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Wu Sheng-Yu;Tsai Pei-Chun;Chang Chih-Horng;Kuo Tin-Hao;Chen Chen-Shien |
分类号 |
H01L23/48;H01L21/50;H01L23/498 |
主分类号 |
H01L23/48 |
代理机构 |
Slater and Matsil, L.L.P. |
代理人 |
Slater and Matsil, L.L.P. |
主权项 |
1. A structure comprising:
a substrate comprising a plurality of traces on a top surface of the substrate; a plurality of connectors formed on a top surface of a semiconductor die, wherein the semiconductor die is bonded on the substrate and coupled to the substrate through the plurality of connectors; and a dummy metal structure formed at a corner of the top surface of the substrate, wherein the dummy metal structure has two discontinuous sections, and wherein a first discontinuous section is located inside an edge of the semiconductor die and a second discontinuous section is located outside the edge of the semiconductor die. |
地址 |
Hsin-Chu TW |