发明名称 |
Composition for forming pattern and in-plane printing method using the same |
摘要 |
A composition for forming a pattern includes: about 1% to about 10% by weight of a liquid prepolymer, about 40% to about 60% by weight of an acrylate having a hydrophilic group, about 10% to about 20% by weight of a viscosity modifier, about 1% to about 5% by weight of a photoinitiator, and an additive. |
申请公布号 |
US8822125(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US200711802552 |
申请日期 |
2007.05.23 |
申请人 |
LG Display Co., Ltd. |
发明人 |
Kim Jin-Wuk |
分类号 |
C08J3/28;G03C1/00;G03F7/00;G03F7/027;H01L21/312;B82Y10/00;G03F7/004;B82Y40/00 |
主分类号 |
C08J3/28 |
代理机构 |
McKenna Long & Aldridge LLP |
代理人 |
McKenna Long & Aldridge LLP |
主权项 |
1. A patterning composition, consisting essentially of:
about 1% to about 10% by weight of a liquid prepolymer, wherein the liquid prepolymer includes one of octafluoropentyl acrylate and octafluoropentyl methacrylate; about 40% to about 60% by weight of an acrylate having a hydrophilic group, wherein the acrylate having the hydrophilic group includes one of diethylene glycol diacrylate and diethylene glycol dimethacrylate; about 10% to about 20% by weight of a viscosity modifier, wherein the viscosity modifier includes one of butyl acrylate and butyl methacrylate; about 1% to about 5% by weight of a photoinitiator; about 10% to about 20% by weight of a photoreactor, wherein the photoreactor includes one of glycidyl acrylate and glycidyl methacrylate; about 10% to about 20% by weight of a thermal flow derivative, wherein the thermal flow derivative includes one of polystyrene, polymethyl acrylate and polymethyl methacrylate; and an additive, wherein the patterning composition is curable by a UV light. |
地址 |
Seoul KR |