发明名称 |
Heterogeneous integration process incorporating layer transfer in epitaxy level packaging |
摘要 |
Methods and structures for heterogeneous integration of diverse material systems and device technologies onto a single substrate incorporate layer transfer techniques into an epitaxy level packaging process. A planar substrate surface of multiple epitaxial areas of different materials can be heterogeneously integrated with a substrate material. Complex assembly and lattice engineering is significantly reduced. Microsystems of different circuits made from different materials can be built from a single wafer Fab line employing the claimed processes. |
申请公布号 |
US8822309(B2) |
申请公布日期 |
2014.09.02 |
申请号 |
US201213724701 |
申请日期 |
2012.12.21 |
申请人 |
Athenaeum, LLC |
发明人 |
Pan Eric Ting-Shan |
分类号 |
H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
|
代理人 |
Gross J. Nicholas |
主权项 |
1. A method of forming an epitaxial structure comprising:
implanting an ion species suitable for exfoliation into a crystalline substrate to form an ion implanted exfoliation layer in said crystalline substrate; bonding a handling substrate to said ion implanted exfoliation layer; separating said handling substrate and ion implanted exfoliation layer from said crystalline substrate; mounting an assembly substrate over said ion implanted exfoliation layer; wherein said assembly substrate includes a number of apertures extending therethrough forming an assembly pattern; growing an epitaxial material within said assembly pattern to form an epitaxial pattern over said ion implanted and recrystallized exfoliation layer. |
地址 |
Zephyr Cove NV US |