发明名称 Heterogeneous integration process incorporating layer transfer in epitaxy level packaging
摘要 Methods and structures for heterogeneous integration of diverse material systems and device technologies onto a single substrate incorporate layer transfer techniques into an epitaxy level packaging process. A planar substrate surface of multiple epitaxial areas of different materials can be heterogeneously integrated with a substrate material. Complex assembly and lattice engineering is significantly reduced. Microsystems of different circuits made from different materials can be built from a single wafer Fab line employing the claimed processes.
申请公布号 US8822309(B2) 申请公布日期 2014.09.02
申请号 US201213724701 申请日期 2012.12.21
申请人 Athenaeum, LLC 发明人 Pan Eric Ting-Shan
分类号 H01L21/30 主分类号 H01L21/30
代理机构 代理人 Gross J. Nicholas
主权项 1. A method of forming an epitaxial structure comprising: implanting an ion species suitable for exfoliation into a crystalline substrate to form an ion implanted exfoliation layer in said crystalline substrate; bonding a handling substrate to said ion implanted exfoliation layer; separating said handling substrate and ion implanted exfoliation layer from said crystalline substrate; mounting an assembly substrate over said ion implanted exfoliation layer; wherein said assembly substrate includes a number of apertures extending therethrough forming an assembly pattern; growing an epitaxial material within said assembly pattern to form an epitaxial pattern over said ion implanted and recrystallized exfoliation layer.
地址 Zephyr Cove NV US