Micro electro mechanical system, semiconductor device, and manufacturing method thereof

摘要

The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

主权项

1. A manufacturing method of a semiconductor device, comprising steps of:
forming a peeling layer over a first substrate; forming a sensor on the peeling layer; forming a first spacer layer over the peeling layer and around the sensor; providing a film over the first spacer layer so as to form a first interspace defined by the first spacer layer, the peeling layer , and the film, the sensor being located in the first interspace; separating the first substrate from a set including the sensor, the film, and the first spacer layer; removing the peeling layer from the sensor; and attaching the set to a second substrate including an electric circuit and a second spacer layer formed over the electric circuit so that a second interspace, defined by the second spacer layer, the sensor, and the second substrate, is formed.