| 发明名称 | Writing apparatuses and methods | ||
| 摘要 | Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing. | ||
| 申请公布号 | US8822879(B2) | 申请公布日期 | 2014.09.02 |
| 申请号 | US201012805708 | 申请日期 | 2010.08.16 |
| 申请人 | Mycronic AB | 发明人 | Stiblert Lars;Sandström Torbjörn;Luberek Jarek;Lock Tomas |
| 分类号 | B23K26/00 | 主分类号 | B23K26/00 |
| 代理机构 | Harness, Dickey & Pierce, P.L.C. | 代理人 | Harness, Dickey & Pierce, P.L.C. |
| 主权项 | 1. A photolithography apparatus for patterning at least one workpiece, the apparatus comprising: a cylindrical holder for holding the at least one workpiece; and a rotor scanner for patterning the at least one workpiece, the rotor scanner including at least two writing units, wherein the rotor scanner is configured to move in an axial direction relative to the cylindrical holder and, concurrently with movement in the axial direction, rotate on an axis when patterning the at least one workpiece, the axis of rotation being substantially parallel to the axial movement of the rotor scanner,the rotor scanner is one of ring and disc-shaped, andthe rotor scanner is configured to rotate relative to the cylindrical holder. | ||
| 地址 | Taby SE | ||