发明名称 SYSTEM AND METHOD FOR DETECTING FLAWS OF CIRCUIT ELEMENTS USING X-RAY
摘要 The present invention relates to a system and a method for inspecting a circuit element using X-rays. The inspecting method is performed by the inspecting system using X-rays, by comprising: a step of radiating X-rays to an object to be inspected, and detecting X-rays penetrating the object in order to obtain a two dimensional (2D) penetration image; a step of deciphering the 2D penetration image in order to firstly decipher a defect of the object; a step of obtaining a 3D penetration image of the object, when a defect suspicious spot is determined to be included in the object in the first deciphering step; a step of deciphering the 3D penetration image in order to secondly decipher a defect of the object; and a step of classifying the object as defective, when a defect suspicious spot is determined to be included in the object in the second deciphering step. Therefore, the system and the method for inspecting the circuit element using X-rays can increase inspection accuracy and efficiency at the same time.
申请公布号 KR101437125(B1) 申请公布日期 2014.09.02
申请号 KR20130050134 申请日期 2013.05.03
申请人 SIST CO., LTD.;KIM, SUN TAEK 发明人 KIM, SUN TAEK
分类号 G01N23/04 主分类号 G01N23/04
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