发明名称 Evaluation device and evaluation method for substrate mounting apparatus and evaluation substrate used for the same
摘要 There are provided an evaluation device and an evaluation method for a substrate mounting apparatus capable of simply evaluating a temperature control function of the substrate mounting apparatus depending on evaluation conditions or circumstances and an evaluation substrate used for the same. The substrate mounting apparatus holds a target substrate mounted on a mounting surface and controls a temperature of the target substrate. The evaluation device includes an evacuable airtight chamber in which the substrate mounting apparatus is provided; an evaluation substrate which is mounted on the mounting surface instead of the target substrate and includes a self-heating resistance heater; and a temperature measurement unit which measures a temperature of the evaluation substrate.
申请公布号 US8823404(B2) 申请公布日期 2014.09.02
申请号 US201113014290 申请日期 2011.01.26
申请人 Tokyo Electron Limited 发明人 Sasaki Yasuharu
分类号 G01R31/00;G01R31/327;G21K5/10;G01J1/00 主分类号 G01R31/00
代理机构 Pearne & Gordon LLP 代理人 Pearne & Gordon LLP
主权项 1. An evaluation device for a substrate mounting apparatus, the device comprising: an evacuable airtight chamber in which the substrate mounting apparatus is provided; an evaluation substrate which is mounted on a mounting surface and includes a self-heating resistance heating body, the resistance heating body being provided on a surface of the evaluation substrate or being provided within the evaluation substrate; and a temperature measurement unit which measures a temperature of the evaluation substrate, wherein the resistance heating body has therein at least one opening through which infrared light for measurement of a temperature of the evaluation substrate is radiated, and the at least one opening is formed to penetrate the resistance heating body, so that the at least one opening has a cylindrical shape enclosed by the resistance heating body.
地址 Tokyo JP