SUBSTRATE PROCESSING APPARATUS, MONITORING DEVICE OF SUBSTRATE PROCESSING APPARATUS, AND MONITORING METHOD OF SUBSTRATE PROCESSING APPARATUS

摘要

An objective of the present invention is to provide a substrate processing apparatus capable of easily and clearly detecting general failure which is suddenly and irregularly generated, a monitoring device of the substrate processing apparatus, and a monitoring method of a substrate processing apparatus. The monitoring device of the substrate processing apparatus is a monitoring device of a substrate processing apparatus monitoring a state of a process for processing a substrate to be processed and includes: an imaging unit which images a processing state of the process; a storage unit; a storage control unit storing a moving picture imaged by the imaging unit after adding a time stamp to the moving picture; a group classification unit grouping a plurality of moving pictures stored in the storage unit into moving pictures of a normal group and moving pictures of a group other than the normal group; and a threshold generation unit generating a threshold for detecting an abnormal moving picture based on the moving pictures of the normal group grouped by the group classification unit.