发明名称 RETICLE CLEAN SYSTEM
摘要 <p>A photomask cleaning device includes a stage, a fluid dispenser, a scrubbing unit, a cover and a fixing unit. The fluid dispenser includes a direct dispensing unit disposed correspondingly to the scrubbing unit, and an oblique dispensing unit obliquely spraying water onto a photomask. Majority of the particles can be removed with the combined application of the oblique dispensing unit and the scrubbing unit.</p>
申请公布号 KR200474234(Y1) 申请公布日期 2014.09.01
申请号 KR20130002946U 申请日期 2013.04.16
申请人 发明人
分类号 G03F1/82;H01L21/027 主分类号 G03F1/82
代理机构 代理人
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