| 发明名称 |
PROCESS FOR TEXTURING THE SURFACE OF A SILICON SUBSTRATE, STRUCTURED SUBSTRATE AND PHOTOVOLTAIC DEVICE COMPRISING SUCH A STRUCTURED SUBSTRATE |
| 摘要 |
<p>The invention relates to a process for texturing the surface of a silicon substrate, comprising a step of exposing said surface to an MDECR plasma generated, at least from argon, using between 1.5 W/cm2 and 6.5 W/cm2 of plasma power in a matrix distributed electron cyclotron resonance plasma source, the substrate bias being between 100 V and 300 V.</p> |
| 申请公布号 |
KR20140105603(A) |
申请公布日期 |
2014.09.01 |
| 申请号 |
KR20147020589 |
申请日期 |
2012.12.20 |
| 申请人 |
TOTAL RAFFINAGE MARKETING;ECOLE POLYTECHNIQUE;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE |
发明人 |
HABKA NADA;BULKIN PAVEL;ROCA I CABARROCAS PERE |
| 分类号 |
H01L31/0236;H01L31/18 |
主分类号 |
H01L31/0236 |
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