发明名称 SILICON WAFER
摘要 Disclosed is a silicone wafer whose quality is improved by controlling oxygen concentration and formation of bulk micro defect (BMD) according to the oxygen concentration. The silicone wafer of an embodiment of the present invention comprises sphere-shaped or ellipsoid-shaped BMDs with the oxygen concentration less than or equal to 15 ppma.
申请公布号 KR20140104847(A) 申请公布日期 2014.08.29
申请号 KR20130018843 申请日期 2013.02.21
申请人 LG SILTRON INCORPORATED 发明人 CHOI, YOUNG KYU;SIM, BOK CHEOL;KIM, JUNG RYUL
分类号 C30B15/20;C30B29/06 主分类号 C30B15/20
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