| 摘要 |
It is provided a device for supporting a rotatable target (1) of a deposition apparatus for sputtering material onto a substrate (20), wherein the device includes a drive unit (2) for rotating the rotatable target (1); a ring-shaped part (3) connected to the drive unit (2) for attaching the drive unit to the rotatable target (1); and, a shield (4) for covering the ring-shaped part (3). The shield (4) is adapted for rotating together with the ring-shaped part (3) and includes a plurality of parts assembled together. Furthermore, a sputtering apparatus and a method for supporting a rotatable target are provided. |
