CYLINDRICAL EVAPORATION SOURCE

摘要

Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (α1) with respect to a first pivot axis.

主权项

1. A cylindrical evaporation source which includes, at an outer cylinder wall a target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and which are arranged in an interior of the cylindrical evaporation source for generating a magnetic field, wherein the first magnetic field source and the second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in accordance with a predefinable scheme in a predefinable spatial region, characterized in that the carrier system is configured for setting the shape and/or the strength of the magnetic field such that the first magnetic field source is arranged at a first carrier arm and can be pivoted by a predefinable first pivot angle (α1) with respect to a first pivot axis.