发明名称 System and Methods For Nano-Scale Manufacturing
摘要 A system and method for patterning a substrate includes a mold holding fixture for holding a mold with nanostructures and a substrate holding fixture for holding a substrate having a molding surface, a stage assembly has two or more independent axis movements for moving either the mold or the substrate therein, a contact force sensor sensing a contact force between the mold surface and the molding surface, a chamber for holding the mold and substrate and for the applying of a pressure inside that is higher or lower than atmospheric pressure, a pressure regulator and a manifold for changing the pressure inside the chamber, a door on the chamber housing provides for selectively allowing the substrate and the mold to pass there through, and means to divide the chamber into two fluidly separate sub-chambers.
申请公布号 US2014239529(A1) 申请公布日期 2014.08.28
申请号 US201314042618 申请日期 2013.09.30
申请人 Nanonex Corporation 发明人 Tan Hua;Hu Lin;Yao Yi;Chou Stephen Y.
分类号 B29C59/00 主分类号 B29C59/00
代理机构 代理人
主权项 1. A method to pattern nano structures on a substrate from a mold comprising the steps of: having a mold having a mold surface with nanostructures; having a substrate having a surface; depositing a deformable material on the surface of the substrate; positioning in a chamber the substrate with the deposited deformable material in a position facing the mold surface of the mold having the nanostructures and having a gap there between; applying a vacuum in the chamber including the gap defined between the positioned substrate and mold; forming a contact between the surface of the substrate and the mold surface of the mold; holding the contact for a predetermined period of time; and separating the substrate and the mold with the deformable material remaining on the substrate and being patterned with nanostructures corresponding to the nanostructures of the mold surface.
地址 Monmouth Junction NJ US