| 发明名称 |
MONOMER, HARDMASK COMPOSITION COMPRISING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION |
| 摘要 |
Provided are a monomer for a hardmask composition which is represented by chemical formula 1, a hardmask composition comprising the monomer and a pattern forming method using the hardmask composition. |
| 申请公布号 |
WO2014129701(A1) |
申请公布日期 |
2014.08.28 |
| 申请号 |
WO2013KR03993 |
申请日期 |
2013.05.08 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
YOON, YONG-WOON;LEE, SUNG-JAE;MOON, JOON-YOUNG;PARK, YOU-JUNG;LEE, CHUL-HO;CHO, YOUN-JIN |
| 分类号 |
C07D407/10;C08G59/22;G03F7/004 |
主分类号 |
C07D407/10 |
| 代理机构 |
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