SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR

摘要

The present invention is a sputtering target characterized in being obtained by bonding a ceramic sputtering target material to a substrate, the ceramic sputtering target material being obtained from multiple ceramic sputtering target material segments and ceramic bonding parts for bonding the multiple ceramic sputtering target material segments into a unit. With this sputtering target, because there are no gaps between adjacent ceramic target material segments even when multiple ceramic target material segments are provided, there is no danger of problems such as abnormal discharge between the edges of the target material segments occurring. Moreover, by making the composition of the ceramic target material segments and the composition of the ceramic bonding parts to be substantially the same, areas with compositions that differ significantly from the composition derived from the ceramic target material segments do not occur in the film obtained from the sputtering.