| 摘要 |
Disclosed is a chemical vapor deposition apparatus for a flat display. According to an embodiment of the present invention, the chemical vapor deposition apparatus for a flat display comprises a susceptor to which a substrate for a flat display is loaded and which is elevated; a gas supplying/exhausting valve arranged in the upper part of the susceptor to supply a deposition material toward the substrate, and to exhaust reactants, which are generated after the deposition material reacts on the surface of the substrate, to an upper part at the same time; a backing plate arranged in the upper part of the gas supplying/exhausting valve to form a buffer space between the backing plate and the gas supplying/exhausting valve; and a reactant exhaust unit for exhausting the reactants flowed in the buffer space through the gas supplying/exhausting valve. |
