| 摘要 |
PROBLEM TO BE SOLVED: To facilitate inspection of thickening and thinning at the lower part of a pattern element.SOLUTION: A pattern inspection device includes: a first image acquisition section 301 for acquiring a top surface reflection image by irradiating light from a first light source section 331 to a first principal surface 91 of a film-like transparent base material 9 where a pattern is formed and by receiving reflection light of the light from the top surface of the pattern by a first light receiving section 341; a second image acquisition section 302 for acquiring an undersurface reflection image by irradiating light from a second light source section 332 to a second principal surface 92 of the transparent base material 9 and by receiving reflection light of the light from the undersurface of the pattern adjacent to the first principal surface 91 by a second light receiving section 342; and an inspection section for acquiring a result of inspection of the pattern on the basis of the top surface reflection image and the undersurface reflection image. Thickening and thinning at a lower part of a pattern element can be easily inspected by comparing the top surface reflection image based on the reflection light from the top surface of the pattern with the undersurface reflection image based on the reflection light from the undersurface of the pattern. |
