发明名称 THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a bottom-gate thin film transistor which includes a substrate, a gate electrode and a gate insulator, further includes a channel layer of a semiconductor composed of In-Ga-Zn-O and a protective layer on a top surface of the semiconductor, and can improve characteristics of the protective layer. ! SOLUTION: In a thin film transistor, a protective layer includes an insulating first layer provided in a lower part, for optimizing a threshold voltage, and an insulating second layer which is provided on the first layer and attaches weight to a passivation function, and the first layer is a SiO2 layer which has a film thickness within a range from 50 nm to 120 nm and contains hydrogen. ! COPYRIGHT: (C)2014,JPO&INPIT
申请公布号 JP2014157907(A) 申请公布日期 2014.08.28
申请号 JP20130027482 申请日期 2013.02.15
申请人 TOPPAN PRINTING CO LTD 发明人 TANAKA KOICHI ; NAKAMURA OSAMU
分类号 H01L29/786;G09F9/30;H01L21/336 主分类号 H01L29/786
代理机构 代理人
主权项
地址