| 摘要 |
A method for producing a microscreen is described in which the microscreen consists substantially of a photoresist material, said method having the following steps: - applying a photoresist layer to a support, - partially covering the photoresist layer with a mask that defines the structure of the microscreen, - exposing the photoresist by means of the effect of radiation, - developing the photoresist, - removing the photoresist from the support, characterized in that, when the photoresist layer is applied, a liquid photoresist is used. |
