NEGATIVE-TYPE PHOTOSENSITIVE SILOXANE COMPOSITION

摘要

Provided is a photosensitive siloxane composition which has high resolution, high thermal resistance, and high transparency; easily controls heat sagging occurring during heat curing while not increasing the molecular weight of a crosslinking agent and a siloxane compound; and has properties of high sensitivity and a high remaining rate. Provided is a negative type photosensitive polysiloxane characterized by comprising: (I) polysiloxane, (II) an aromatic imide compound releasing an acid by laser irradiation, and (III) a solvent.