| 摘要 |
The present invention relates to a photoacid generator and a resist composition comprising the same, which can restrain the acid diffusion, reduce the line edge roughness, increase the acid yield, improve the light sensitivity of a resist, especially improve the resist light sensitivity when a pattern utilizing the extreme ultraviolet (EUV) photoetching is formed. The photoacid generator is represented by the formula 1, in the formula, the substituent groups are defined as in the specification. |
