| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a gas supply member which inhibits shedding of yttria particles, and to provide a plasma processing apparatus.SOLUTION: A gas supply member according to one embodiment includes a gas supply passage including a gas passage having a first diameter and a discharge port which is connected with one end part of the gas passage and is provided on the main surface side, the discharge port where an opening diameter increases from the end part so that a diameter thereof becomes a second diameter larger than the first diameter. An yttria containing film is directly provided on a surface forming the discharge port and an alumina film is provided on a side surface of the gas passage.</p> |
